{"id":153,"count":7,"description":"
An error-free reticle (also known as a photomask or mask) represents a critical element in achieving high semiconductor device yields, since reticle defects or pattern placement errors can be replicated in many die on production wafers. Reticles are built upon blanks: substrates of quartz deposited with absorber films. 51ÁÔÆæ\u2019s portfolio of reticle inspection, metrology and data analytics systems help blank, reticle and IC manufacturers identify reticle defects and pattern placement errors, thereby reducing yield risk.<\/p>","link":"https:\/\/www.kla.com\/products\/reticle-manufacturing","name":"Reticle Manufacturing","slug":"reticle-manufacturing","taxonomy":"product_cat","parent":0,"meta":[],"acf":[],"yoast_head":"\n